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dc.contributor.authorVallejo-Giraldo, Catalina
dc.contributor.authorPampaloni, Niccolò Paolo
dc.contributor.authorPallipurath, Anuradha R.
dc.contributor.authorMokarian-Tabari, Parvaneh
dc.contributor.authorO'Connell, John
dc.contributor.authorHolmes, Justin D.
dc.contributor.authorTrotier, Alexandre
dc.contributor.authorKrukiewicz, Katarzyna
dc.contributor.authorOrpella-Aceret, Gemma
dc.contributor.authorPugliese, Eugenia
dc.contributor.authorBallerini, Laura
dc.contributor.authorKilcoyne, Michelle
dc.contributor.authorDowd, Eilís
dc.contributor.authorQuinlan, Leo R.
dc.contributor.authorPandit, Abhay
dc.contributor.authorKavanagh, Paul
dc.contributor.authorBiggs, Manus Jonathan Paul
dc.date.accessioned2018-09-20T16:27:32Z
dc.date.available2018-09-20T16:27:32Z
dc.date.issued2017-03-01
dc.identifier.citationVallejo-Giraldo, Catalina; Pampaloni, Niccolò Paolo; Pallipurath, Anuradha R. Mokarian-Tabari, Parvaneh; O'Connell, John; Holmes, Justin D.; Trotier, Alexandre; Krukiewicz, Katarzyna; Orpella-Aceret, Gemma; Pugliese, Eugenia; Ballerini, Laura; Kilcoyne, Michelle; Dowd, Eilís; Quinlan, Leo R.; Pandit, Abhay; Kavanagh, Paul; Biggs, Manus Jonathan Paul (2017). Preparation of cytocompatible ito neuroelectrodes with enhanced electrochemical characteristics using a facile anodic oxidation process. Advanced Functional Materials 28 (12),
dc.identifier.issn1616-301X
dc.identifier.urihttp://hdl.handle.net/10379/14254
dc.description.abstractPhysicochemical modification of implantable electrode systems is recognized as a viable strategy to enhance tissue/electrode integration and electrode performance in situ. In this work, a bench-top electrochemical process to formulate anodized indium tin oxide (ITO) films with altered roughness, conducting profiles, and thickness is explored. In addition, the influence of these anodized films on neural cell adhesion, proliferation, and function indicates that anodized ITO film cytocompatibility can be altered by varying the anodization current density. Furthermore, ITO-anodized films formed with a current density of 0.4 mA cm(-2) show important primary neural cell survival, modulation of glial scar formation, and promotion of neural network activity.
dc.publisherWiley-Blackwell
dc.relation.ispartofAdvanced Functional Materials
dc.subjectcytocompatibility
dc.subjectelectrodes
dc.subjectfunctionalization
dc.subjectindium tin oxide
dc.subjectneural interfaces
dc.subjectindium-tin-oxide
dc.subjectlight-emitting-diodes
dc.subjectthin-films
dc.subjectorganic bioelectronics
dc.subjectprotein adsorption
dc.subjectneural interfaces
dc.subjectpolyethylene terephthalate
dc.subjectsurface characterization
dc.subjectimpedance spectroscopy
dc.subjectelectrical-stimulation
dc.titlePreparation of cytocompatible ito neuroelectrodes with enhanced electrochemical characteristics using a facile anodic oxidation process
dc.typeArticle
dc.identifier.doi10.1002/adfm.201605035
dc.local.publishedsourcehttps://cora.ucc.ie/bitstream/10468/6516/7/05161932583adfm.201605035.pdf
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