Preparation of cytocompatible ito neuroelectrodes with enhanced electrochemical characteristics using a facile anodic oxidation process
View/ Open
Full Text
Date
2017-03-01Author
Vallejo-Giraldo, Catalina
Pampaloni, Niccolò Paolo
Pallipurath, Anuradha R.
Mokarian-Tabari, Parvaneh
O'Connell, John
Holmes, Justin D.
Trotier, Alexandre
Krukiewicz, Katarzyna
Orpella-Aceret, Gemma
Pugliese, Eugenia
Ballerini, Laura
Kilcoyne, Michelle
Dowd, Eilís
Quinlan, Leo R.
Pandit, Abhay
Kavanagh, Paul
Biggs, Manus Jonathan Paul
Metadata
Show full item recordUsage
This item's downloads: 0 (view details)
Cited 13 times in Scopus (view citations)
Recommended Citation
Vallejo-Giraldo, Catalina; Pampaloni, Niccolò Paolo; Pallipurath, Anuradha R. Mokarian-Tabari, Parvaneh; O'Connell, John; Holmes, Justin D.; Trotier, Alexandre; Krukiewicz, Katarzyna; Orpella-Aceret, Gemma; Pugliese, Eugenia; Ballerini, Laura; Kilcoyne, Michelle; Dowd, Eilís; Quinlan, Leo R.; Pandit, Abhay; Kavanagh, Paul; Biggs, Manus Jonathan Paul (2017). Preparation of cytocompatible ito neuroelectrodes with enhanced electrochemical characteristics using a facile anodic oxidation process. Advanced Functional Materials 28 (12),
Published Version
Abstract
Physicochemical modification of implantable electrode systems is recognized as a viable strategy to enhance tissue/electrode integration and electrode performance in situ. In this work, a bench-top electrochemical process to formulate anodized indium tin oxide (ITO) films with altered roughness, conducting profiles, and thickness is explored. In addition, the influence of these anodized films on neural cell adhesion, proliferation, and function indicates that anodized ITO film cytocompatibility can be altered by varying the anodization current density. Furthermore, ITO-anodized films formed with a current density of 0.4 mA cm(-2) show important primary neural cell survival, modulation of glial scar formation, and promotion of neural network activity.